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2 edition of Plasma activated growth of reactively sputtered optical thin films found in the catalog.

Plasma activated growth of reactively sputtered optical thin films

Kazuki Oka

Plasma activated growth of reactively sputtered optical thin films

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Published .
Written in English


Edition Notes

Thesis(Ph.D.) - Loughborough University of Technology.

Statementby Kazuki Oka.
ID Numbers
Open LibraryOL13931351M

Stainless steel films were reactively magnetron sputtered in argon/nitrogen gas flow onto oxidized silicon wafers using austenitic AISI stainless-steel targets. The deposited films of about nm thickness were characterized by conversion electron Mössbauer spectroscopy, magneto-optical Kerreffect, X-ray diffraction, Rutherford. 3AV ConCVD and ProConCVD: Development of High-Throughput CVD Tools on the Way to Low-Cost Silicon Epitaxy 1CV Preparation of Reactively Sputtered SnO2:Sb Electrodes with the Application of TiO2 Layers. Montero, 1CV Optical Properties of Magnetron Sputtered Thin Dielectric Films Containing Terbium(III) for Spectral. The state-of-the art analysis is presented in the first part of the book, where current hypotheses concerning the composition and growth of nitrided layers composed of γN phase are discussed. The existing models of nitriding mainly concern plasma processes and they are critically analysed in chapter 2 on the basis of the author's own research. Preparation of Prussian blue thin films Electrochemistry, in situ spectroscopy and characterisation of Prussian blue thin films Prussian blue electrochromic devices Prussian blue analogues References 9 Miscellaneous inorganic electrochromes Fullerene-based electrochromes


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Plasma activated growth of reactively sputtered optical thin films by Kazuki Oka Download PDF EPUB FB2

The reactive sputtering lowers the growth temperature. The growth temperature of reactively sputtered PZT ferroelectric thin films is as low as °C, as shown in Fig. Further study on reactive sputtering will further lower the growth temperature of functional materials. Based on the reactive sputtering mechanism, a high rate deposition process for optical thin films is proposed.

66 The system comprises a metal deposition region and oxidizing zone. Figure shows the construction of a deposition system for antireflection (AR) coating. Thin metal Nb or Si film is deposited by DC magnetron sputtering on to the substrates and successively oxidized immediately.

Olaya, Plasma activated growth of reactively sputtered optical thin films book, low-friction thin films (Heimberg et al., ) corrosion-resistant thin films (Flores et al., ), and thin films used as a protective optical system (Stefan et al., ), as.

A reactively sputtered iridium oxide (IrOx) thin film has been developed as electrochemical modification material for microelectrodes to obtain high stability and charge storage capacity (CSC) in. TiO2 thin films are used extensively for a broad range of applications including environmental remediation, self-cleaning technologies (windows, building exteriors, and textiles), water splitting, antibacterial, and biomedical surfaces.

While a broad range of methods such as wet-chemical synthesis techniques, chemical vapor deposition (CVD), and physical vapor deposition (PVD) have been Cited by: 4. The wettability of reactively sputtered Y2O3, thermally oxidized Y-Y2O3 and Cd-CdO template assisted Y2O3 coatings has been studied.

The wettability of as-deposited Y2O3 coatings was determined by contact angle measurements. The water contact angles for reactively sputtered, thermally oxidized and template assisted Y2O3 nanostructured coatings were 99°, ° and °, by: @article{osti_, title = {Optical properties of sputtered amorphous beryllium nitride thin films}, author = {Khoshman, J M and Khan, A and Kordesch, M E and Department of Physics and Astronomy, Ohio University, Athens, Ohio }, abstractNote = {The optical properties of amorphous beryllium nitride (a-Be{sub 3}N{sub 2}) thin films deposited on Si () at temperature.

Proc. SPIEOptical Thin Films, pg (29 April ); doi: / Read Abstract + Measurement is reported at 4 deg K (and blocked transmittance below ) of PbTe/ZnS thin-film filters deposited on Ge substrates. Silver incorporated zinc sulfide thin films are prepared by RF magnetron sputtering technique and the influence of silver incorporation on the structural, optical and luminescence properties is analyzed using techniques like grazing incidence X-Ray diffraction (GIXRD), atomic force microscopy (AFM), field emission scanning electron microscopy (FESEM), energy dispersive X-ray spectroscopy (EDS.

Most of our early insight into sputtered thin films in a plasma were based on phenomenological observations, resulting from carefully changing voltages, pressures, gases, and substrate temperature in different discharge configurations and by correlating their effects on the structure and composition of the resultant film and its physical Author: Eric Kay, John W.

Coburn. 3 Invited Speakers (in alphabetical order) André Anders (Lawrence Berkeley National Laboratory, USA): Oxide films and oxide nanoparticles via physical vapor deposition Uroš Cvelbar (Jozef Stefan Institute, Slovenia): Deterministic growth of metal oxide nanowires in oxygen plasma Diederik Depla (Ghent University, Belgium): Fundamentals of sputtering oxide thin films.

Abstract. Bioengineering solves problems that confront health professionals in daily practice. Medically-related technical challenges range from complex large-scale diagnostic or managing tools such as NMR tomography and laboratory medicine or hospital information systems, to the design and development of implant devices and materials in a wide range of applications from artificial cardiac Cited by: Optical and RF transparent protective alumina thin films; Structural and mechanical properties of reactively sputtered TiAlC nanostructured hard coatings; July(1) Nanoindentation response of ITO film; June(3) Cu/TiO¬2 thin films prepared by reactive RF magnetron sputtering; Enhanced room temperature ferromagnetism in electrodeposited co-doped.

T.Z. Gorishnyy, S.M. Aouadi, L.G. Olson, and S.L. Rohde “Modeling of Mechanical and Optical Properties of Chromium Nitride Single Layer and Multilayer Films”, VIII International Conference on Physics and Technology of Thin Films, Ivano-Frankivsk, Ukraine ( May ).

Conference Location The Ninth International Conference on Plasma Surface Engineering will be held in the Kongresshaus (Congress-Center) Richard-Strauss-Platz D Garmisch-Partenkirchen (Germany) Conference Office The conference office is located.

Comparison of the properties of ion-plated TiC films prepared by different activation methods, Fukutomi, M., Fujitsuka, M., Okada, Ft., Thin Solid Films() A comparative study was made of titanium carbide films ion plated onto molybdenum by d.c.

and r.f. discharge methods, from the point of view of the characteristics of the discharge and the quality of deposits made by each by: 1. Freeform and Laser Optical Coatings by Inline Magnetron Sputtering Glöß, Daniel; Hartung, Ullrich; Drescher, Andy; Frach, Peter; Bartzsch, Hagen: Conference Paper: Influence of growth conditions and film thickness on the anodization behavior of sputtered aluminum films and the.

AbstractThe present work deals with nitrogen-doped stoichiometric TiO2:N and non-stoichiometric TiO2−x:N thin films deposited by means of dc-pulsed reactive sputtering for application as photoanodes for hydrogen generation from water, using solar energy. Stoichiometric thin films of TiO2 crystallize as a mixture of anatase and rutile while rutile phase predominates in TiO2:N at higher Cited by: 4.

Ruffner J A, Clem P G, Tuttle B A, Dimos D and Gonzales D M Effect of substrate composition on the piezoelectric response of reactively sputtered AIN thin films Thin Solid Films – Crossref Google ScholarCited by: Abstract: TiO 2 thin films were prepared on glass substrates by sol-gel method.

The effect of withdraw speed on the thickness and optical properties of TiO 2 thin films was investigated. The films were transparent in the visible wavelength. The thickness of the TiO 2 films was increased from 90 nm for the withdraw speed of μm/s to nm for the withdraw speed of μm/s.

KEYWORDS: Aluminum nitride, Thin films, Sputter deposition, Distributed Bragg reflectors, Ultraviolet radiation, Optical properties, Argon, Mass attenuation coefficient Read Abstract + Aluminum nitride (AlN) thin films were studied to assess the dependence of their optical properties on their chemical and structural characteristics.

Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.

The optical gaps of SBT thin films deposited onto fused silica substrates were determined from the measurements of the optical transmission in the wavelength range of to nm. The optical gaps for as-deposited and annealed SBT thin films are and eV, respectively.

The adhesion and failure mechanism of RF magnetron sputtered SiC thin films on steel 33 and nanocrystalline Si-C-N films on Si were also repor99 and compared to a-CN x in latter by: 3.

In the present work, anodic mixed titanium/tantalum oxide nanotubes are prepared for the first time with subnm surface pore size and tube inner diameter. The morphological changes induced by the introduction of Ta into the Ti metal matrix are investigated, leading to remarkable geometrical variations dependent on the Ta loading.

The UV-light activation necessary to trigger electron Cited by: 2. The sensitivity of the WO 3 sensing films deposited with interruptions by radio frequency (r.f.) sputtering onto silicon micro-machined substrates were higher than that obtained for the WO 3 thin films deposited with basic technology due to the decrease of grain size in the WO 3 films [95,96].

The sensors also show good selectivity to reducing Cited by: Scratch resistant optical coatings on polymers by magnetron-plasma-enhanced chemical vapor deposition Täschner, K.; Bartzsch, H.; Frach, P.; Schultheiss, E.

Journal Article, Conference Paper: Smart ultrasonic sensors systems: Potential of aluminum nitride thin films for the excitation of the ultrasound at high frequencies. that thin films have over thick films, semicon­ ductor integrated circuits, and discrete com­ ponents.

Component Characteristics RESISTORS All thin resistance films in general usage have temperature coefficients nearer to zero than the bulk parent material. Nichrome films of ohms per square on glass substrates have a.

Seung-Ik Jun, Anatoli V. Melechko, Timothy E. Mcknight, Michael L. Simpson, Philip D. Rack Characterization of reactively sputtered silicon dioxide thin films for fully sputtered metal-insulator-semiconductor switching devices, Electronics Letters, Iss.

14, No. 07, pp. 59 – 60 (July ). “Nano-engineered coatings and thin films symposium” will be the proposed new title of the former symposium EE on “Protective Coatings and Thin Films” one. Emphasis will be given to the development of new thin films for mechanical, tribological, optical, biological and energy-based Issues in Applied Physics / Edition is a ScholarlyEditions™ eBook that delivers timely, authoritative, and comprehensive information about Applied Physics.

The editors have built Issues in Applied Physics: Edition on the vast information databases of ScholarlyNews.™ You can expect the information about Applied Physics in this eBook to be deeper than what you can access anywhere.

A new generation of SiOCH thin films was developed, the dielectric constant being lowered from for a PECVD oxide to k = for SiOCH, which is integrated in production for technologies at the node at 90 nm. However, this strategy of carbon incorporation in a silica matrix shows its limits in terms of k.

Co-author of one book, edited one book and three book chapters, technical papers; two patents Books and Book Chapters Book - "Diffraction from Rough Surfaces and Dynamic Growth", H.-N.

Yang, G.-C. Wang, and T.-M. World Scientific, Singapore (). Animation & Cartoons Arts & Music Computers & Technology Cultural & Academic Films Ephemeral Films Movies News & Public Affairs.

Understanding 9/ Spirituality & Religion Sports Videos Television Videogame Videos Vlogs Youth Media. Full text of "Laser induced damage in optical: ". “Very low-refractive-index optical thin films consisting of an array of SiO 2 nanorods”, J.-Q.

Xi, Jong Kyu Kim, E. Schubert, Dexian Ye, T.-M. Lu, and Shawn-Yu Li n, Optics Lett (). “ Electroless copper on refractory and noble metal substrates with an ultra-thin plasma-assisted atomic layer deposited palladium layer. Superhydrophobic alumina surface based on stearic acid modification Structural and optical properties of ZnO thin films prepared by sol–gel method with different thickness.

Xu, In situ growth of Ge-rich poly-SiGe:H thin films on glass by RF magnetron sputtering for photovoltaic applications. The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. The main work is regularly updated with new topics, and this volume presents additional recipe-type information (i.e.

important deposition system. Monday Afternoon, J Monday Afternoon, J 2 PM ALD Applications Room - Session AA1-MoA Memory Device & Materials I Moderators: Steven M.

George. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications.

The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. Saraswat, "Physical and Electrical Properties of Polycrystalline Silicon Thin Films," Proceedings of Symposium on Grain Boundaries in Semiconductors, Materials Research Society, Boston, Novemberpp.

~, Volume 5. (Invited). *Thin Film Growth of Reactive Sputter Deposited Tungsten-Carbon Thin Films, 48th International Symposium of the American Vacuum Society (November ).

Composite Tantalum Nitride-Silicon Nitride Thin Films for nm Embedded Attenuated Phase Shift Masks, 48th International Symposium of the American Vacuum Society (November ).Animation & Cartoons Arts & Music Computers & Technology Cultural & Academic Films Ephemeral Films Movies News & Public Affairs.

Full text of "Fiber-Optic Temperature Sensor Using a Thin-Film Fabry-Perot Interferometer".For growth stage depositions, films deposited for 10 seconds as the substrate temperature was ramped at K/min from K, then for 10 minutes at K, resulted in films with strong Al() crystal orientation compared to the films deposited for 10 min at a constant substrate temperature of K.

AES analyses showed the deposited films to.